Aimed at Industry and Academia, Three-day International Event will Explore New Technologies, Challenges and Solutions in Surface Cleaning
Northeastern University is organizing and hosting its 5th Annual Surface Cleaning Workshop to present and discuss current and future challenges and solutions in surface cleaning, offering tutorials, workshops and a host of guest speakers.
Organized by Northeastern University and Hanyang University of Seoul, South Korea, the three-day internationally-focused event will take place from November 12–14 at Northeastern University’s campus and the Colonnade Hotel in Boston. The conference will include invited and contributed presentations and panel discussions.
Ahmed A. Busnaina, Ph.D., William Lincoln Smith Professor and Director of the NSF Center for Microcontamination Control and the Nanomanufacturing Research Institute at Northeastern University, will provide the opening remarks during the November 13 workshop at the Colonnade.
“Surface cleaning and preparation is a necessary and required process that precedes most manufacturing processes in the manufacturing of all of consumer and commercial electronics, storage, medical and many other applications,” said Busnaina. “Without surface cleaning, these products’ yield will be low and most of today’s electronics could be very expensive.”
Dr. Busnaina specializes in wafer cleaning technology, chemical and particulate contamination in semiconductor processes, particle adhesion and removal, submicron particle transport, deposition and removal in clean environments.
Agenda for the three-day event:
The agenda will feature speakers representing both industry and academia. They include SEZ, Sony, Northeastern University, DuPont/EKC Technology, Entegris, University of North Texas, Texas A&M University, Hanyang University, KLA-Tencor Corp, SACHEM, Sematech, and Purdue University.
Monday, November 12th (8:00 – 5:00)
Raytheon Amphitheatre at Northeastern University, 120 Forsyth Street, Boston, MA 02115
An all-day tutorial on the fundamentals of surface cleaning with an emphasis on Post-CMP cleaning is tailored to meet the needs of engineers, chemists, managers, consultants, certifying personnel and other professionals involved with surface cleaning, preparation or engineering, particle removal and contamination control responsibility in the semiconductor, flat panel display, disk drive and other industries involved in clean manufacturing.
Specific tutorials will focus on the fundamentals of particle adhesion, hydrodynamic and brush cleaning, megasonic and ultrasonic cleaning, dry ice cleaning and laser cleaning.
Tuesday, November 13th (8:30 – 7:00) and Wednesday, November 14th (8:30 – 2:30)
The Colonnade Hotel, 120 Huntington Ave., Boston, MA 02116
Aimed at giving end-users, researchers and suppliers, the two-day workshop will provide a forum to discuss new technologies, solutions and limitations in meeting surface cleaning needs. Topics that will be discussed and presented at the workshop include the challenges in filtration for Post CMP cleaning chemistries, particle adhesion to photomask substrates, fundamentals and wet and dry cleaning, enhanced cleaning chemistry for particle removal and damage-free cleans, new advances in EUV mask blank cleaning and the effects of plasma damage on low-k film surface properties and moisture adsorption.
This event is sponsored by Entegris, SACHEM Inc., NANO-MASTER Inc., UV Tech Systems, Solid State Equipment Corporation, Scientific Gear L.L.C., DuPont/EKC Technology, Mattson.
For more information, please contact Renata Nyul at 617–373-7424 or email@example.com and visit http://www.cmc.neu.edu/meetings_events/5th_surface_cleaning/
Founded in 1898, Northeastern University is a private research university located in the heart of Boston. Northeastern is a leader in interdisciplinary research, urban engagement, and the integration of classroom learning with real-world experience. The university’s distinctive cooperative education program, where students alternate semesters of full-time study with semesters of paid work in fields relevant to their professional interests and major, is one of the largest and most innovative in the world. The University offers a comprehensive range of undergraduate and graduate programs leading to degrees through the doctorate in six undergraduate colleges, eight graduate schools, and two part-time divisions. For more information, please visit www.northeastern.edu.